Instrumentation

Group's Instrumentation

1. Bruker Avance NMR (400 MHz for 1H)
2. Bruker Kappa Apex II diffractometer.
3. Laser transient absorption facility with excitation in UV and visible (266 nm, 355 nm, 532nm, 410 – 2650 nm, continuously). Detection in Uv-Vis, point-by-point with Xe lamp probe (260 – 800 nm, time resolution ca. 100 ps). Detection in MIR, continuous with step-scan FTIR FT-IRS-66/V (4500 – 400 cm-1, time resolution ca. 35 ns), point-by-point with Quantum cascade lasers (2317-2197, 2235-2105, 2230-2020, 2072-1977, 1981-1873, 1903-1774, 1813-1692, 1670-1536, 1395-1306, 1258-1181 and 1135-1051 cm-1, time resolution ca. 5ns).
4. Resonance Raman spectrometer with Ar ion laser source.
5. Continuous photolysis systems with various light sources.
6. Various diode array spectrophotometers.
7. Stanford Research System QMS 300 mass-spectrometric gas analyzer equipped with a custom batch sampling vacuum system for oxygen detection.
8. Inert atmosphere dryboxes (one is equipped for electrochemical and UV-vis measurements) and one “wet-box” (air-free but equipped for aqueous chemistry).
9. Optical probe-based (Ocean Optics) and Clark electrode (YSI 5300A) dissolved/gaseous oxygen measurement systems.
10. High-pressure spectroscopic cells for UV-VIS-NIR-IR spectroscopy up to 5000 psi (34.5 MPa), together with associated gas filling station equipped with Teledyne ISCO high-pressure syringe pumps.
11. Hewlett-Packard 5890 GC with flame ionization and thermal conductivity detectors; Agilent 6890N GC with flame ionization and thermal conductivity detectors; Agilent 6890N GC-MS.
12. Thermo-Finnegan LCQ Advantage LC-MS.
13. Several Bioanalytic Systems Electrochemical Analyzers (potentiostats).
14. Computing Instrumentation:
    • One quad-core AMD Opteron workstations with 48 cores and 128 GB of memory
    • One quad-core AMD Opteron workstations with 32 cores and 128 GB of memory
    • Eight quad-processor quad-core AMD Opteron clustered workstations with 64 GB of memory
    • Sixteen dual-processor dual-core AMD Opteron clustered workstations with 16 GB of memory
    • Nineteen dual-processor dual-core AMD Opteron 1U rackmount cluster, each node with 16 GB of memory
    • Eight dual-processor GHz Intel Xeon clustered workstations with 4 GB of memory
    • Eleven 6-core and three 12-core processor Linux workstations (administered by A. Cook, TPR).

BNL Chemistry Department Facilities and Instrumentation

Brookhaven’s Center for Radiation Chemistry Research (ACER) is located in BNL's Chemistry Department. It includes a ⁶⁰Co gamma-source (0.5 MRad / hr.), a 2 MeV Electron Van de Graaff accelerator with transient absorption detection on the full UV-Vis spectral range (200-800 nm, time resolution ~40 ns), and the Laser-Electron Accelerator Facility (LEAF) based upon a 9 MeV RF photocathode electron gun accelerator. A regeneratively-amplified femtosecond laser system provides 266 nm illumination of the photocathode and other wavelengths (800 nm fundamental, 400 nm second harmonic, and 240-2600 nm by optical parametric amplification) for probe beams. Transient absorption detection systems at LEAF include a pulse-probe apparatus (resolution ~7 ps, 240-1600 nm), an ultrafast-single-shot apparatus (resolution ~10 ps, 400-950 nm) and a digitizer-based apparatus (detector dependant resolution from 150 ps to 5 ns, from 250-2500 nm). A spectrally resolved pulse-probe experiment is planned (resolution ~7 ps, 450-1600 nm).

Instrumentation at the Center for Functional Nanomaterials (CFN)

Existing equipment includes (but not exhaustively):  Elmitec LEEM III, VT UHV STM (Custom Built), Omicron VT UHV STM, Molecular Imaging Fluid and Environmentally Controlled STM, AFM, Electrochemistry, JEOL JEM 3000F and JEM 4000Ex TEM, JEOL JEM 2200FS and JEM 2010FEF TEM, JEOL JSM6400 SEM, PHI 699 Scanning Auger, SILAR robot (Gilson), PLD (Neocera), E-beam evaporator, Lab X-ray diffraction (Rigaku Miniflex), UV spectrometer (Flororat-02-Panorama, Spectrodyn Technologies), Differential Scanning Calorimetry/Thermogravimetric Analysis (DTA/TGA, Netsch), Optical microscopes (Nikon), ICP/AES (Hewlett Packard), AFM (Nanoscope II) Major equipment has been ordered for: Facility for Surfaces, Interfaces, Catalysis—Proximal Probes; Transmission Electron Microscopy Facility; Nanopatterning Facility; Facility for Electronic Materials and Inorganic Nanomaterials; and Facility for Soft and Bio-nanomaterials.

Experiments at National Synchrotron Light Source (NSLS)

The following beamlines are currently used by the group PIs and collaborators.

Beamline U7A: Capabilities for doing photoemission and near-edge X-ray absorption spectroscopy. Can be used with single-crystal or powder surfaces. The ultra-high vacuum chamber attached to the beamline is equipped with typical instrumentation (AES, XPS, LEED, TPD) for doing surface science studies.

Beamline U4IR: Newly purchased vacuum FTIR is being interfaced with the existing UHV chamber for grazing incidence single reflection absorption IR spectroscopy on well-defined surfaces.

Beamline U2B: In situ far infrared experiments for electrode materials.

Beam line X7A: The high-resolution mode where a water-cooled Si(111) monochromator and a Ge(220) analyzer or multi-analyser setup provide a resolution of Dd/d = 2 x 10^-4. This configuration is used for ab initio solution of complex structures, investigations of phase transitions (subtle lattice distortions, weak superlattice reflections) and studies involving diffraction in the vicinity of absorption edges. The high-throughput mode using a linear position-sensitive detector gating on the Kr-escape peak built by Graham Smith (Instrumentation, BNL) without an analyzer crystal. This lower resolution mode (Dd/d~10-3) allows for much higher counting rates from smaller samples and much faster data collection as a function of temperature. Typically temperature ranges fall between 20 and 700K. With a 40 degree PSD this machine could set new standards in how fast and how many datasets can be measured as a function of temperature or charge state (electrochemistry). Instrument could also have image plate/CCD capability for single crystal work. The PDF mode, where a semiconductor detector is employed. Compromising resolution even further but providing good counting statistics combined with reasonable energy discrimination provides data for pair-distribution function (PDF) studies.

Beamline X7B: Capabilities to acquire fast X-ray diffraction spectra using an image plate or CCD detector. Time-resolved XRD experiments can be carried out in a remarkably wide variety of temperature and pressure conditions (-190 C < T < 900 C, P < 45 atm). Equipment to perform in situ kinetic studies is attached to the X-ray diffraction cell that contains the catalytic material and the products of reaction can be detected with a mass spectrometer. In situ synthesis can be performed and monitored using special capillary cells.

Beamlines X18/X19A: Capabilities for recording XANES and EXAFS spectra of catalytic materials. A set of reactors is available that can be combined with instrumentation to make EXAFS measurements in transmission or fluorescence yield mode.

Beamlines X18/X19A: The electrochemistry-oriented X22A beam line for SXS in situ studies.

Beamlines X11A, X8A and X23: For in situ XANES and EXAFS measurements for electrode materials.

Last Modified: September 13, 2012

One of ten national laboratories overseen and primarily funded by the Office of Science of the U.S. Department of Energy (DOE), Brookhaven National Laboratory conducts research in the physical, biomedical, and environmental sciences, as well as in energy technologies and national security. Brookhaven Lab also builds and operates major scientific facilities available to university, industry and government researchers. Brookhaven is operated and managed for DOE's Office of Science by Brookhaven Science Associates, a limited-liability company founded by the Research Foundation for the State University of New York on behalf of Stony Brook University, the largest academic user of Laboratory facilities, and Battelle, a nonprofit, applied science and technology organization.

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