Hosted by: Aaron Stein

Second CFN Workshop on Electron Beam Lithography Tuesday and Wednesday February 17 & 18, 2015 9:30am - 4:30pm Electron beam lithography (EBL) is a key enabling tool for nanofabrication and nanoscience. The Nanofabrication facility at the Center for Functional Nanomaterials (CFN) at Brookhaven National Laboratory (BNL) invites its Users, potential CFN Users, external EBL users both novice and expert and anyone else interested in learning about this technique to a workshop to on electron beam lithography. The Workshop will include presentations on electron beam lithography techniques and results from current users. Also highlighted will be tips and strategies from CFN Personnel on how to effectively use our Nanofabrication facilities. The workshop will focus on practical information about specific techniques, applications and troubleshooting. Short talks will take place in an informal setting with plenty of time for questions and discussion. This is an excellent opportunity to learn about the different types of structures and applications of EBL, to get answers to questions both basic and complex and to help build your EBL knowledge base. One full day of the workshop will be devoted to pattern preparation techniques. Featured will be an applications engineer from GenISys Inc. to present the BEAMER software with hands-on demonstrations of advanced pattern conversion techniques and tutorials on the use of proximity effect correction.