Scope

LEEM-PEEM is a biennial meeting reviewing the status of LEEM, PEEM, SPLEEM, XPEEM and related techniques. It aims at promoting and disseminating applications of cathode lens microscopy to a broad audience of interested scientists.

The Workshop highlights the most recent scientific advances as well as instrumental developments. Topics will cover surfaces, thin films, organic films, surface chemistry, magnetism, time resolved methods, instrumental advances and novel applications of LEEM, and PEEM to other subject areas.

Workshop Registration

Early registration (standard fee: US$450) for the Workshop will open on February 28, 2010 and close on June 1, 2010. Late registration (late registration: US$650) will be possible through August 1, 2010, at an increased rate. The registration fee includes the welcome reception on August 8, 2010, coffee and refreshments throughout the workshop, as well as the conference outing and banquet on August 11, 2010. Additional tickets (US$100/ticket) for the conference banquet can be requested while registering for this Workshop. Hotel reservation is not included in the Workshop registration.

The reduced fee of US$250 (late student registration: US$400) is available to students who can certify that they are working toward a master or PhD in science. Please make sure to email a copy of the Student ID Card or a letter of confirmation from your institution to the conference secretariat at registration time. The organizers reserve the right to cancel the registration if this documentation is not provided.

Conference Photo

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Program

The program will feature three Distinguished Guest Lecturers: Chuhei Oshima (Waseda University, Japan), Phillip First (Georgia Institute of Technology) and Eli Rotenberg (Lawrence Berkeley National Laboratory), who will present research results relevant to the LEEM/PEEM field. In addition there will be over 40 contributed talks, as well a poster session. Talks will be presented from a dedicated PC, using PowerPoint. Distinguished Guest Lectures will be 40 minutes long (including 5 minutes for discussion), while all other talks: 20 minutes (including 5 minutes for discussion).

Proceedings

Proceedings of the Workshop will be published in the IBM Journal of Research and Development. With an impact factor of 3.70 the IBM Journal compares favorably with other well known journals in our field, and provides timely publication without page charges.

Deadline for manuscript submission is October 1, 2010. To download a template for your paper click here.

The IBM Journal is published in electronic format only, and will be available in the IEEE Xplore digital library. All registered Workshop attendees will receive a CD of the complete Proceedings upon publication in September 2011.

Workshop Venue

This years Workshop will be held at the Grand Hyatt New York. Click here for more information about accommodations, getting to and around New York, directions and other vital information about this event.

There will be a conference outing and banquet on August 11, 2010. Additional tickets (US$100/ticket) for the conference banquet can be requested while registering for this Workshop.

International Advisory Board

Michael Altman (Hong Kong Univ. of Science & Tech, Hong Kong)
Ernst Bauer (Arizona State University, USA)
Gary Kellogg (Sandia National Laboratories, USA)
Takanori Koshikawa (Osaka Electro-Communication Univ., Japan)
Andrea Locatelli (Elettra Synchrotron Laboratory, Trieste, Italy)
Bene Poelsema (University of Twente, Netherlands)
Rudolf Tromp (IBM T.J. Watson Research Center, USA)

Local Organizers

Jim Hannon (IBM T.J. Watson Research Center), Co-chair
Jurek Sadowski (CFN, BNL)
Peter Sutter (CFN, BNL)
Rudolf Tromp (IBM T.J. Watson Research Center), Chair

Abstract Submission

An abstract (maximum 1 page, including figures) is required for each presentation. The deadline for the abstract submission is June 1st, 2010. Submit your Camera-ready PDF file with the abstract to the following email address lp7@us.ibm.com.

Tutorial 

The organizers will offer a special LEEM/PEEM Tutorial for interested students and scientists on Sunday August 8, and Friday August 13, 2010. Instructors will be Michael Altman, Andreas Scholl, Jim Hannon and Rudolf Tromp. Session I, on Sunday August 8 will be held at the Grand Hyatt Hotel in New York.

This part of the Tutorial will give an introduction to LEEM/PEEM for the dynamic study of surfaces, interfaces, thin films, etc. Session II, on Friday August 13, will provide a hands-on demonstration of LEEM/PEEM capabilities and instrument operation (both with and without aberration correction) at the IBM T.J. Watson Research Center in Yorktown Heights, NY.

This Tutorial will provide a unique opportunity for students and scientist just joining the field to get an in-depth introduction to the LEEM and PEEM techniques, and to see two of the most advanced instruments in action. Of course, there will be ample opportunity for discussion and questions. Learn from the experts, so that you can be more effective when you return to your LEEM/PEEM system at home!

Please contact the conference office at lp7@us.ibm.com if you are interested in participating in the LEEM/PEEM Tutorial

Related Information

• LEEM User Community Page

Sponsors

Click images below to view information about each sponsor.

Last Modified: August 19, 2010