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Brookhaven National Laboratory

Welcome to the

Advanced Electron Microscopy in Materials Physics Workshop

Workshop attendees

   
Date: November 7-8, 2007
Location: Brookhaven National Laboratory (BNL)
Center for Functional Nanomaterials, Building 735, Seminar Room
Organizers: Dr. Konrad Jarausch, Hitachi High Technologies America
Yimei Zhu, Brookhaven National Laboratory


Motivation & Plans

Brookhaven National Laboratory and Hitachi High Technologies America are hosting a workshop on Advanced Electron Microscopy in Materials Physics. This two day workshop will feature presentations by internationally prominent scientists working at the frontiers of electron microscopy, both on instrumentation development and applications in materials science.

The workshop is structured to stimulate scientific exchanges and explore new capabilities. While the scientific themes of the workshop are focused on aberration corrected STEM and EELS, other advanced electron microscopy methods for application of materials physics are also incorporated.

Invited speakers include P. Batson, R. Borkowski , N. Browning, M. Haider, A. Kirkland, B. Kabius, D. Muller, S. Pennycook, H. Rose, M. Ruehle and R. Tromp.

There will be an opportunity check out the newly installed cold field emission, probe-corrected, dedicated-STEM equipped with an ultra-fast high resolution EELS, and tour the new Center for Functional Nanomaterials as well!



Workshop Registration

Additional GIS Registration for Non-U.S. Citizens - If you are a Non-U.S. Citizen, you must complete a Guest Registration Form in addition to the Workshop Registration. Due to a required review process which will take about three weeks, ALL Foreign National attendees must be registered and approved in the BNL Guest Information System (GIS) before they will be allowed access to the site. The link to GIS will be provided to you after you have registered for this event. If you already have a BNL ID card and an active Guest Appointment there is no need to register in the GIS System.

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Last Modified: December 10, 2007