Welcome to the
Advanced Electron Microscopy in Materials Physics Workshop
||November 7-8, 2007
||Brookhaven National Laboratory (BNL)
Center for Functional Nanomaterials, Building 735, Seminar Room
Dr. Konrad Jarausch, Hitachi High Technologies America
Yimei Zhu, Brookhaven National Laboratory
Motivation & Plans
Brookhaven National Laboratory and
Hitachi High Technologies America
are hosting a workshop on Advanced Electron Microscopy in Materials Physics.
This two day workshop will feature presentations by internationally
prominent scientists working at the frontiers of electron microscopy, both
on instrumentation development and applications in materials science.
The workshop is structured to stimulate scientific exchanges and explore
new capabilities. While the scientific themes of the workshop are focused on
aberration corrected STEM and EELS, other advanced electron microscopy
methods for application of materials physics are also incorporated.
Invited speakers include P. Batson, R. Borkowski , N. Browning, M. Haider,
A. Kirkland, B. Kabius, D. Muller, S. Pennycook, H. Rose, M. Ruehle and R.
There will be an opportunity check out the newly installed cold field
emission, probe-corrected, dedicated-STEM equipped with an ultra-fast high
resolution EELS, and tour the new Center for Functional Nanomaterials as
Additional GIS Registration for Non-U.S. Citizens - If you are a
Non-U.S. Citizen, you must complete a Guest Registration Form in addition to
the Workshop Registration. Due to a required review process which will
take about three weeks, ALL Foreign National attendees
must be registered and approved in the BNL Guest Information System
(GIS) before they will be allowed access to the site. The link to GIS will
be provided to you after you have registered for this event. If you already have a BNL ID card and an active Guest Appointment there is no need to register in the GIS System.
Last Modified: January 31, 2008