Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons

Atsuro Nakano, Takahiro Kozawa, Seiichi Tagawa, Tomasz Szreder, James F. Wishart, Toshiyuki Kai and Tsutomu Shimokawa

Jpn. J. Appl. Phys., 45, L197-L200 (2006). [Find paper at the Japanese Journal of Applied Physics]

Abstract:

In chemically amplified resists for ionizing radiations such as electron beams and extreme ultraviolet (EUV), low-energy electrons play an important role in the pattern formation processes. The reactivity of acid generators with low-energy electrons was evaluated using solvated electrons in tetrahydrofuran, which were generated by a pulsed electron beam. The rate constants of acid generators with the solvated electrons ranged from 0.6 to 1.9 x 10¹¹ M^-1s^-1.