NSLS-II Engineering Seminar Series

During the last decade, we have seen ultra-fast progress in X-ray optics performances. This enhancement is directly linked to the development of the necessary tools to control these optical components. In parallel to the design and construction of new synchrotron radiation sources quite important efforts are required to upgrade existing and develop new x-ray optics that is capable of conditioning powerful x-ray beams with minimum losses of brilliance.
In the context of these research and development activities a well-equipped laboratory is absolutely vital. It is now necessary to characterize optical surface figures, slope errors and roughness on meter-long optics over spatial frequencies as short as 0.1 mm and with slope errors reaching less than 100 nrad rms or surface figure errors close to 1 nm to preserve the high brightness made available by third and fourth generation synchrotron/FEL sources like NSLSII or LCLS.
The NSLS-II Optical Metrology Laboratory (NSLSII-OML) includes commercial instruments for measuring long spatial frequency figure errors, mid spatial frequencies and high frequency roughness and had developed new instruments to measure slope errors:
This talk provides a brief description of the different instruments currently available in the laboratory and gives an overview of the active R&D efforts within the NSLSII-OML.