NSLS-II Engineering Seminar Series

In order to produce high quality optics, deposition equipment must be designed with the utmost in stability and flexibility. Limitations encountered with the first generation of APS deposition systems led to new designs, including the NSLS-II MLL Deposition System and three machines at the APS. The goals for the latest machine, called the "Modular Deposition System" are not only to produce a wide variety of multilayer and other thin-film based x-ray optics, but also to allow the APS to initiate an ion-beam figuring (IBF) based mirror surface correction capability. Off-line surface metrology can be utilized for iterative feedback into the fabrication process, however, the prospect of obtaining surface figure information without the need to extract the substrate from the vacuum chamber provides a number of performance advantages such as increased throughput, quasi-real time deposition feedback, and the flexibility to work with reactive materials. By locating the interferometry transmission flat remotely within the UHV system, errors in the measurement induced by environmental factors such as air turbulence and humidity may be minimized. Provisions for a dynamically-actuated aperture will be used to explore methods for 3-D multilayer deposition intended to enable the use of new optical geometries and allow for higher efficiency and mirror figure correction. Multilayer deposition will be the first priority for the machine, while the other features related to metrology, figuring, and the dynamic aperture will be brought online later as they are developed.