Wednesday, April 15, 2009, 9:00 am — NSLS-II Seminar Room, Bldg. 817
This presentation is to provide a sound foundation in the fundamentals of process of etching thin films in semiconductor application. A fundamental overview of etching, especially dry etching and its application on silicon will be presented.
An overview of plasma principles and interaction will be presented, followed by discussion of dry etch process issues and etch chemistry on Si process. A through review of etching methodology for Si application and its analysis will be provided.
Hosted by: Yong Cai
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