Friday, September 25, 2009, 12:00 pm — Seminar Room, Bldg. 725
The ion bombardment of surfaces is of considerable scientific and technological interest. Theoretical and experimental work has shown it to be a complex process, in some cases leading to surface instabilities that produce self-assembled nanostructures while leading in other cases to nanoscale surface smoothening. However, important questions remain about the fundamental processes acting on the surface during the bombardment. Using real-time GISAXS we’re able to make detailed comparisons of observed kinetics with theory that are difficult or impossible with other methods. Our primary focus has been on surface morphology development of Si during low-energy (< 1000 eV) Ar+ ion bombardment, both the native development of the surface and the formation of nanodots via Mo “seeding” during bombardment.
Hosted by: Christie Nelson
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