Wednesday, October 7, 2009, 11:00 am — Bldg. 480 conference room
Filtered cathodic vacuum arc (FCVA) systems belong to a new generation of plasma source for thin film deposition. Using a homemade FCVA system, I synthesized atomically smooth ultrathin (<3 nm) amorphous carbon films on silicon.1 My studies of such films revealed their growth mechanisms by FCVA, and their unique surface/interface properties with a couple of nanometer thickness. For example, I have identified the film growth at sub-surface regions by energetic carbon ion implantation, and carbon atom hybridization under the influence of atomic collision. My further collaborative work with the Lawrence Berkeley National Laboratory shows that the FCVA systems can be integrated to achieve versatile applications in industry.2
In this talk, I will review my most recent studies of carbon film synthesis and carbon ion implantation by the FCVA process. The extensive surface characterization results by XRD, XRR, AFM, XPS, Raman, RBS and nanoscale mechanical testing demonstrate desirable properties of the FCVA-synthesized ultrathin carbon films for industrial applications. I will also briefly review my experimental research of CuAlNi shape-memory alloy which is a promising aerospace engineering material, by the techniques of TEM, synchrotron, RBS, etc.3
Hosted by: Ivan Bozovic
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