Center for Functional Nanomaterials Seminar

"Benefits of Aberration Corrected TEM for Material Science Problems"

Presented by Bernd Kabius, Center for Electron Microscopy, Materials Science Division, Argonne National Laboratory

Monday, November 16, 2009, 9:30 am — CFN Bldg. 735 1st Floor Conf. Rm. B

During the last 10 years several aberration-correction concepts for electron microscopes have succeeded in improving spatial resolution and analytical capabilities. Electron optical systems for correction of spherical aberration are now a valuable tool for material science research and several investigations have already exploited some of the benefits of Cs-correction for high-resolution TEM and STEM. The TEAM project is a collaborative DOE project which will extend the present capabilities of aberration correction technology. The goals for aberration correction within the TEAM project are:

 Correction of higher order aberrations such as fifth order spherical aberration is required for improving interpretability at sub-Angstrom resolution (TEM) and higher beam currents in smaller electron probes (STEM).
 Improving the information limit to 0.5Å by correction of chromatic aberration (Cc) and energy monochromation.

This progress in electron beam instrumentation is expected to have a strong impact on in-situ TEM, magnetic imaging and analytical electron microscopy. The benefits of Cs - and Cc - correction for material science problems requiring these methods will be discussed and first results using Cc-correction will be presented.

• “The electron microscopy was accomplished at the Electron Microscopy Center for Materials Research at Argonne National Laboratory, a U.S. Department of Energy Office of Science Laboratory operated under Contract No. DE-AC02-06CH11357 by UChicago Argonne, LLC.”

Hosted by: Emilio Mendez

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