Tuesday, January 12, 2010, 10:30 am — NSLS-II Seminar Room, Bldg. 817
Applications such as FEL and recent 3rd generation synchrotron sources imply further improvement of the achievable beamline optics quality. Here the level for the residual slope errors can be as small as 0.1 µrad. In addition beam quality preservation in the scattering process frequently demands height errors in the order of 0.5-1nm rms over the clear aperture combined with surface roughness about 0.1 nm rms.
These new challenges are out of reach without proper profiling, interferometric and/or stitching methods.
However the process technology for the manufacturing of surfaces in desired quality range cannot be achieved without close interaction of metrology and figuring. Collaboration of mirror manufacturers and optics groups at the user facilities on topics such as figuring iterations with external surface data and metrology cross comparison is mandatory.
Hosted by: Qun Shen
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