Tuesday, February 2, 2010, 10:30 am — NSLS-II Seminar Room, Bldg. 817
Generalization of specific optical metrology and systematic testing of all delivered components has yield in the last decade to a significant improvement of the optical surfaces installed on synchrotron radiation (SR) beamlines around the world. Surface roughness is classically characterized by phase-shift interferential microscope, sometimes AFM. Long trace profiler (LTP), which measures the local slope along a line profile, has been the choice instrument to measure figure errors of large size components. Controlling optical components (mirrors, crystals, gratings) is an essential task in order to predict the properties of a beamline and optimize its alignment and final performances. Synchrotron center around the world have developed the appropriate equipment and in the last ten years have accumulated a large expertise and moreover, the ability of measuring reliably small departure from the ideal shape has generated a continuous improvement of the quality of the optics deliver by the main synchrotron mirror manufacturers.
In this talk, I will focus on the development of Metrology capabilities develop at SOLEIL Synchrotron both in the optical metrology laboratory and using the Metrology and Tests Beamline. I will report also on some R&D activities develop during the last years:
Design, development, test and use of active x-ray optics coupled with wavefront analyser.
2 D stitching system based on Shack Hartmann wavefront
I will then concluded describing some new ongoing development in order to be able to measure the optical component needed to achieve diffraction limited focal spot on new Nanoprobe beamlines
Hosted by: Qun Shen
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