Monday, February 2, 2015, 11:00 am

Hosted by: Peggs/Kewisch

Monday, February 2, 2015, 11:30 am

Hosted by: Kewisch/Peggs

Wednesday, February 4, 2015, 2:00 pm

Hosted by: Sally Dawson

Thursday, February 5, 2015, 4:30 pm

Hosted by: Robert Konik

Wednesday, February 11, 2015, 2:30 pm

Resolving the time evolution of fast processes, measuring the time-of-flight of particles, and looking at time correlations in spatially resolved events are the main drivers for the development of imagers with the best possible time resolution. In the talk I will briefly review the fast imaging in general and then will discuss applications of a fast camera with 10 ns resolution to time resolved X-ray imaging and to imaging mass spectrometry. The camera, which is based on a silicon sensor and Timepix readout chip, successfully recorded the first data at several mass spectrometers and at NSLS-I.

Thursday, February 12, 2015, 12:30 pm

Hosted by: Tomomi Ishikawa

Friday, February 13, 2015, 12:00 pm

Hosted by: Amarjit Soni

Tuesday, February 17, 2015, 9:30 am

Hosted by: Aaron Stein

Second CFN Workshop on Electron Beam Lithography Tuesday and Wednesday February 17 & 18, 2015 9:30am - 4:30pm Electron beam lithography (EBL) is a key enabling tool for nanofabrication and nanoscience. The Nanofabrication facility at the Center for Functional Nanomaterials (CFN) at Brookhaven National Laboratory (BNL) invites its Users, potential CFN Users, external EBL users both novice and expert and anyone else interested in learning about this technique to a workshop to on electron beam lithography. The Workshop will include presentations on electron beam lithography techniques and results from current users. Also highlighted will be tips and strategies from CFN Personnel on how to effectively use our Nanofabrication facilities. The workshop will focus on practical information about specific techniques, applications and troubleshooting. Short talks will take place in an informal setting with plenty of time for questions and discussion. This is an excellent opportunity to learn about the different types of structures and applications of EBL, to get answers to questions both basic and complex and to help build your EBL knowledge base. One full day of the workshop will be devoted to pattern preparation techniques. Featured will be an applications engineer from GenISys Inc. to present the BEAMER software with hands-on demonstrations of advanced pattern conversion techniques and tutorials on the use of proximity effect correction.

Tuesday, February 17, 2015, 11:00 am

Hosted by: Jiangyong Jia

We perform a Principal Component Analysis (PCA) of $v_3(p_T)$ in event-by-event hydrodynamic simulations of Pb+Pb collisions at the LHC. The PCA procedure identifies two dominant contributions to the two particle correlation function, which together capture 99.9\% of the squared variance. We find that the subleading flow (which is the largest source of flow factorization breaking in hydrodynamics) is predominantly a response to the radial excitations of a third-order eccentricity. We present a systematic study of the hydrodynamic response to these radial excitations in 2+1D viscous hydrodynamics. Finally, we construct a good geometrical predictor for the orientation angle and magnitude of the leading and subleading flows using two Fourier modes of the initial geometry.

Wednesday, February 18, 2015, 9:30 am

Hosted by: Aaron Stein

Second CFN Workshop on Electron Beam Lithography Tuesday and Wednesday February 17-18, 2015 9:30am - 4:30pm Electron beam lithography (EBL) is a key enabling tool for nanofabrication and nanoscience. The Nanofabrication facility at the Center for Functional Nanomaterials (CFN) at Brookhaven National Laboratory (BNL) invites its Users, potential CFN Users, external EBL users both novice and expert and anyone else interested in learning about this technique to a workshop to on electron beam lithography. The Workshop will include presentations on electron beam lithography techniques and results from current users. Also highlighted will be tips and strategies from CFN Personnel on how to effectively use our Nanofabrication facilities. The workshop will focus on practical information about specific techniques, applications and troubleshooting. Short talks will take place in an informal setting with plenty of time for questions and discussion. This is an excellent opportunity to learn about the different types of structures and applications of EBL, to get answers to questions both basic and complex and to help build your EBL knowledge base. One full day of the workshop will be devoted to pattern preparation techniques. Featured will be an applications engineer from GenISys Inc. to present the BEAMER software with hands-on demonstrations of advanced pattern conversion techniques and tutorials on the use of proximity effect correction.

Friday, February 20, 2015, 12:00 pm

Hosted by: Amarjit Soni

Monday, February 23, 2015, 5:00 pm

Hosted by: Christine Scaffidi

A panel of three experts will review briefly three new Supreme Court decisions which have resulted in the US Patent Office issuing guidelines which are having a significant impact on the prosecution of patent applications as they relate to what is patentable subject matter.

Thursday, February 26, 2015, 3:00 pm

Hosted by: Elizabeth Worcester

I will present the first cross section measurements for charged current coherent pion production by neutrinos and antineutrinos on argon. These measurements are performed using the ArgoNeuT detector exposed to the NuMI beam at Fermilab. The results are in a good agreement with the theoretical predictions from GENIE and NuWro.

Thursday, March 12, 2015, 6:30 pm

Wednesday, March 18, 2015, 8:30 am

Wednesday, March 18, 2015, 2:00 pm

Wednesday, April 8, 2015, 2:00 pm

Friday, April 17, 2015, 12:00 pm

Hosted by: Amarjit Soni