Zhitian Shi
Research Associate Materials Science, Electronic Materials, Center for Functional Nanomaterials
Brookhaven National Laboratory
Center for Functional Nanomaterials
Bldg. 735, Room 2047
P.O. Box 5000
Upton, NY 11973-5000
(631) 304-6625
zshi2@bnl.gov
Dr. Zhitian Shi is a Research Associate at the Center for Functional Nanomaterials (CFN), Brookhaven National Laboratory, specializing in the nanofabrication of diffraction optics for extreme ultraviolet (EUV) interference lithography. His work involves advanced techniques such as electron beam lithography, plasma etching, and thin-film processing to enable high-resolution patterning for next-generation lithographic and metrology applications.
He earned his Ph.D. from ETH Zurich, where he developed a tilted plasma etching method for high aspect ratio X-ray diffraction gratings, advancing phase contrast imaging for biomedical diagnostics. Prior to joining CFN, he held a Research Associate position at the University of Cambridge, conducting research in photonic integration and 3D nanoprinted optical interposers. He also worked as a Process Engineer at Samsung, optimizing fabrication processes for 3D-VNAND flash memory. With experience across academia and industry, he actively contributes to interdisciplinary research, mentoring, and peer review in the fields of nanofabrication, optics, and semiconductor technologies.
Education | Appointments | Publications
Education
- Ph.D., ETH, Zurich, Switzerland, 2022
- X-ray Tomography
- M.S., General Research Institute for Nonferrous Metals, Beijing, China, 2015
- Materials Science and Engineering
- B.E., Northeastern University, Shenyang, China, 2011
- Materials Science and Engineering
Professional Appointments
- Brookhaven National Laboratory, Center for Functional Nanomaterials
- Research Associate, 2025 - present
- University of Cambridge, Centre for Photonic Systems
- Research Associate, 2022 - 2025
- Samsung (China) Semiconductor Co. Ltd
- Process Engineer, 2015 - 2018
Selected Publications
- Shi Z, Jefimovs K, La Magna A, et al (2022) High aspect ratio tilted gratings through local electric field modulation in plasma etching. Applied Surface Science 588:152938. https://doi.org/10.1016/j.apsusc.2022.152938
- Shi Z, Jefimovs K, Romano L, et al (2021) Laboratory X-ray interferometry imaging with a fan-shaped source grating. Optics Letters 46:3693. https://doi.org/10.1364/ol.426867
- Shi Z, Jefimovs K, Stampanoni M, Romano L (2023) High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch. Materials Science in Semiconductor Processing 157:107311. https://doi.org/10.1016/j.mssp.2023.107311
- Huang H, Shi Z, Talli G, et al (2024) Photonic chiplet interconnection via 3D-nanoprinted interposer. Light: Advanced Manufacturing 5:1. https://doi.org/10.37188/lam.2024.046
- Yao C, Zhang W, Bao P, et al (2024) Chip-scale sensor for spectroscopic metrology. Nature Communications 15:. https://doi.org/10.1038/s41467-024-54708-x
- Rawlik M, Pereira A, Spindler S, et al (2023) Increased dose efficiency of breast CT with grating interferometry. Optica 10:938. https://doi.org/10.1364/optica.487795
- Shi Z, Josell D, Jefimovs K, et al (2022) Fabrication of a fractal pattern device for focus characterizations of X-ray imaging systems by Si deep reactive ion etching and bottom-up Au electroplating. Applied Optics 61:3850. https://doi.org/10.1364/ao.456427
- Josell D, Shi Z, Jefimovs K, et al (2020) Pushing the Limits of Bottom-Up Gold Filling for X-ray Grating Interferometry. Journal of The Electrochemical Society 167:132504. https://doi.org/10.1149/1945-7111/abba63
Brookhaven National Laboratory
Center for Functional Nanomaterials
Bldg. 735, Room 2047
P.O. Box 5000
Upton, NY 11973-5000
(631) 304-6625
zshi2@bnl.gov
