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International Workshop for New Opportunities in Hard X-ray Photoelectron Spectroscopy: HAXPES 2009

May 20 - May 22, 2009  [ Workshop Talks ]  [ Workshop Posters ]

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workshop poster

Photoelectron spectroscopy can uniquely measure the electronic structure of a solid, but owing to the generally limiting electron mean-free path, the technique is extremely surface sensitive, probing only the first few atomic layers of a structure, especially if low energy, ultra-violet photons are used. For this reason, hard x-ray photoelectron spectroscopy (HAXPES), where the photon energy is typically in the 1.5 - 15 keV range, is emerging as a technique with substantial promise for studying the electronic structure of complex systems.

Some examples include: The highly correlated and narrow-band materials, such as the transition-metal oxides, have considerably different electronic structure at the surface than in the bulk, and these problems only compound in the study of delicate structural and electronic instabilities. The use of higher energy x-ray photons enables the combination of well established x-ray techniques (such as diffraction) with photoemission to produce both atomically and chemically specific information. The ability to tune the electron mean-free path with photon energy enables the study of buried layers and interfaces with specific length scales that are relevant to industry. The brightness of 3rd generation synchrotron sources opens the opportunity of 3-dimensional chemical imaging, while mitigating the reduced photoelectron cross sections and matching the small focal spots of modern electron analyzers at the higher electron kinetic energies.

This 3-day international conference will present an overview of the worldwide effort in HAXPES, highlighting new opportunities, new ideas, and future plans. Topics will include the fundamental science enabled by HAXPES, while providing a forum for in-depth discussion on the relevance of HAXPES to industry:

  • electronic and atomic structure
  • correlated materials
  • industrial applications
  • the combination of photoemission and other techniques
  • high pressure
  • theory
  • imaging
  • new instrumentation and sources

Location: Brookhaven National Laboratory, Long Island, NY, USA

Costs: Registration Fee $200.00 - Banquet: $65.00 (Additional banquet tickets are available for spouses, colleagues, guests, etc. when you register.)


Sponsors: The National Synchrotron Light Source, The National Synchrotron Light Source II Project, The Brookhaven National Laboratory Condensed Matter Physics and Materials Science Department, and The National Institute of Standards and Technology


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