Optical and At Wavelength Metrology Team
The NSLS-II Optical Metrology Laboratory (OML) is housed in two class 10,000 temperature
controlled clean rooms (2x450 ft2) providing a dust-free environment that protects sensitive
optical surfaces from contamination. There are three commercial instruments for measuring:
long spatial frequency figure errors with a ZYGO MST Fizeau-type 4’’ interferometer,
capable of 0.1nm sensitivity. This interferometer can be used in grazing incidence geometry to increase
the measuring field of view.
2D Slope measuring System based on a Stitching Shack Hartmann Optical Head (SSH-OH)
with 50 nrad slope error accuracy over a measurement range of 8 mrad. Mirror max. length about 1500 mm.
high frequency roughness with a Nanosurf AG AFM performing at linearity better than
0.2% over the 80 um measurement area and sensitivity approaching 0.01nm.
Associated to these commercial instruments: a NOM/ long trace profiler (LTP) with 50
nrad slope error accuracy over a measurement range of 10 mrad. Mirror max. length about 900 mm.
50 mm pupil FIZEAU interferometer. This interferometer will be used to build a
dedicated stitching platform for diffraction limited x-ray mirror metrology
mid spatial frequencies with an upgraded ZYGO NewView 6300 white light interferometric
microscope, capable of reaching 0.1nm repeatability at a lateral resolution from 10 um to 1mm