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Dual Beam SEM/FIB Microscope

Facility NanofabricationCategory Electron Microscopy Full Catalog

The dual beam SEM/FIB system is capable of simultaneous focused ion beam milling and SEM imaging. Further capabilities are: in-situ electrical measurements, high-resolution electron-beam and ion-beam lithography, gas injector for electron or ion beam assisted deposition of platinum or carbon, nano-manipulator probe; and high-resolution SEM (1 nm), FIB (5 nm), and STEM (0.8 nm) imaging.

Manufacturer: FEI Helios NanoLab