Equipment Catalog

Surface atomic structure characterization:

• Scanning tunneling microscope (Omicron VT- STM -XA 650) for imaging surface structures with atomic resolution at variable surface temperatures from RT to 500 K
• Low energy electron diffraction (LEED) for analysis of surface structures of single-crystalline materials.

Surface chemical and electronic structure characterization:

• X-ray photoelectron spectroscopy (XPS) for analysis of surface elemental compositions, chemical states, relative atomic concentrations (1–10 nm from top surface), and depth profiling of elemental composition distributions on each surface layer.
• Low-energy Ion scattering spectroscopy (LEIS) for detection of surface elements in the outermost layer.
• Ultraviolet photoelectron spectroscopy (UPS) for valence band acquisitions and work function measurements.

Surface chemical property analysis:

• Temperature programmed desorption (TPD)for determining the kinetic and thermodynamic parameters of thermal desorption processes or decomposition reactions on surfaces, particularly apply to study the interaction of reaction gases with adsorbates on surface for exploration of catalytic reactivities and selectivities.

UHV in-situ sample preparation and nanostructure fabrication:

• Ar⁺ ion sputtering and thermal annealing for clean surface preparations.
• Thermal vapor deposition of metals, gases, and liquids onto substrates at temperatures ranging from 90K to 1100 K, with thickness monitored by a Quartz Microbalance for the fabrication of supported nanostructures.
• Compact reaction cell enables simultaneous reaction of two gases with samples under pressure range of 10^-9 torr to milli-torr and temperature range from room temperature to 1200K.