- Home
- Facilities
- Research
-
Working at CFN
- Arrival & Departure
- Reports & Publications
- Acknowledging Use of CFN Facilities
- Data Management
- The Guide to Brookhaven
Safety Procedures
- Operations Plan
- Experimental Safety Reviews (ESR)
- COSA Training
- Hours of Operation
- Laser System Qualification
- Transport of Hazardous Materials
- Vendor On-site Scheduling Procedure (PDF)
- News & Events
- People
- Jobs
- Contact
- Business
- Intranet
Equipment Catalog
Pulsed Laser Deposition System PLD/MBE 2300
Materials Synthesis and CharacterizationCategory: Deposition (Evaporators/Sputterers/Pecvd/Coaters) Full Catalog
The pulsed laser deposition system (PVD Products PLD-MBE 2300) is used for synthesis of complex metal oxides or nitride thin-films by laser ablation. The tool is equipped with a 248 nm KrF excimer laser (Lambda Physik COMPex PRO 102) that operates at repetition rates up to 20 Hz with 400 mJ per pulse for a maximum power output of 6 watts. The tool features a programmable 6-position target manipulator and supports radiative, non-contact substrate heating up to 950 ºC. This capability was added to the facility during FY2015.
Manufacturer: PVD Products