Equipment Catalog

This magnetron sputtering systems (AJA Orion) is a compact, high-vacuum physical vapor deposition tool designed for the sputtering deposition of metal and dielectric thin films. It is equipped with four 1.5" RF sputtering sources and two independently operated 300 W RF generators with automatic matching networks. Two of the sputtering sources can be operated simultaneously, enabling co-deposition and combinatorial deposition of various materials. In addition to the standard plasma gas of Ar, the tool is also installed with N2 and O2 gases for reactive sputtering. The substrate can be heated radiatively to 800C.