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General purpose Reactive Ion Etcher

Facility NanofabricationCategory Etching and Ashing Full Catalog

The general purpose plasma etch tool (Trion Phantom III) is used for etching thin films generally 1 µm or less in thickness. A variety of processes for etching thin layers of photoresist, metal, semiconductors, or insulators are available. This instrument was repaired during 2014.

Manufacturer: Trion Phantom III