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UV Mask Aligner

Facility NanofabricationCategory Lithography Full Catalog

The system (Karl Suss MA-6 UV Mask Aligner) is capable of exposing photoresist patterns down to 1 micron resolution with UV light at two wavelengths (405 nm and 240m nm). Substrate sizes range from mm-size chips to 4-inch diameter wafers. The tool has backside alignment capability.

Manufacturer: Karl Suss MA6