General Lab Information

Equipment Catalog

UV Mask Aligner

Facility: NanofabricationCategory: Lithography Full Catalog

The system (Karl Suss MA-6 UV Mask Aligner) is capable of exposing photoresist patterns down to 1 micron resolution with UV light at two wavelengths (405 nm and 240m nm). Substrate sizes range from mm-size chips to 4-inch diameter wafers. The tool has backside alignment capability.

Manufacturer: Karl Suss MA6