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Equipment Catalog
UV Mask Aligner
NanofabricationCategory: Lithography Full Catalog
The system (Karl Suss MA-6 UV Mask Aligner) is capable of exposing photoresist patterns down to 1 micron resolution with UV light at two wavelengths (405 nm and 240m nm). Substrate sizes range from mm-size chips to 4-inch diameter wafers. The tool has backside alignment capability.
Manufacturer: Karl Suss MA6
Location: Cleanroom
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Nikhil Tiwale
(631) 344-3782, ntiwale@bnl.gov
 
Lab Phone: (631) 344-4335