BNL Home

Equipment Catalog

Reactive Ion Etcher (RIE)

Facility Materials Synthesis and CharacterizationCategory Etching and Ashing Full Catalog

This tool (March Plasma CS1701F) is used for radio frequency (RF) plasma etching of organic and inorganic thin films using combinations of six process gases (SF6, CF4, CHF3, O2, Ar, and CF3Br).

Manufacturer: March Plasma

Blue system (left)