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Drawing at the One-Nanometer Length Scale
May 23, 2017
What is the scientific achievement?
CFN scientists have adapted a state-of-the-art electron microscope for lithography in order to achieve unprecedented one nanometer resolution —i.e., at the single-molecule level. These results are a significant improvement over the previous resolution limits of electron-beam lithography, a widely-used nanofabrication technique.
Why does this achievement matter?
These results demonstrate the importance of both the texture's characteristic feature size and shape on its antifogging ability.
What are the details?
Top: Illustration of a focused electron beam (green) shining through a polymeric film (round particles are atoms of the film). The glowing area indicates the feature to be fabricated at the molecular length scale. Bottom: An arbitrary design printed at single-digit nanometer dimensions.
CFN Electron Microscopy and Nanofabrication Facilities were used for nanostructure fabrication, processing, and imaging.
Vitor Riseti Manfrinato, Aaron Stein, Lihua Zhang, Chang-Yong Nam, Kevin G Yager, Eric A Stach, Charles T Black, Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale, Nano Letters 17 (2017).
Acknowledgement of Support
Research carried out at the Center for Functional Nanomaterials, which is supported by the U.S. Department of Energy, Office of Basic Energy Sciences, under Contract No. DE-SC0012704.
2017-12254 | INT/EXT | Newsroom