Equipment Catalog

Three separate physical vapor deposition systems (all Kurt J. Lesker PVD75) are available for thin-film sputter, thermal, and electron-beam deposition of a wide variety of materials. The sputter deposition system contains three source targets for magnetron sputtering. The electron-beam system has four deposition source materials.  A third system dedicated for high-throughput deposition of metals for electrical contacts has two thermal sources and four e-beam sources for a select set of materials as well as an ion gun and back sputter capabilities for pre-deposition surface cleaning and preparation.