Equipment Catalog

Instrument Overview:

The AJA ultra-high-vacuum (UHV) electron-beam (e-beam) evaporator is a dedicated thin-film deposition system for the growth of high-quality metallic and alloy thin films for TEM experiments and related nanoscience applications. The system is optimized for the deposition of single-crystalline and polycrystalline metal/alloy thin films under ultra-high-vacuum conditions and elevated substrate temperatures.

Key Capabilities:

• Growth of metallic and alloy thin films with thicknesses below 100 nm. 
  • Oxides and semiconductors thin-film growth are not permitted on this system. 
• Ultra-high-vacuum deposition environment for oxygen-sensitive materials
  • Only UHV compatible materials are allowed. Plastics, tape, grease, photoresists, and other contamination-sensitive materials are prohibited.
• High-purity deposition using dual e-beam sources with 12-pocket capability
• Co-deposition of multi-element alloy thin films
• Elevated-temperature substrate growth for epitaxial film deposition
• Compatible with TEM substrates and specialized substrate holders
• Growth of single-crystalline, textured, and polycrystalline metal thin films