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Fernando Camino

Staff Scientist | Electron Microscopy


  • Electrical characterization at low temperatures and under magnetic fields

  •  In-situ electrical characterization in the SEM and TEM

  • Electronic device fabrication, including all-inclusive device fabrication in the SEM/FIB system

  • Aberration-corrected e-beam lithography

  • UV, e-beam, and ion-beam lithography

  • Operation of liquid helium and biasing TEM holders

  • Fabrication of electrical contacts to TEM samples for biasing experiments

CFN Research Activities

“I am experienced in electrical characterization of nanostructured materials subjected to light, temperature and magnetic fields stimuli. These studies usually demand the development of novel nanofabrication techniques. For example, I am currently working in the use of an aberration-corrected STEM to perform e-beam lithography, pushing the limits of conventional lithography processes towards the fabrication of devices with 1 nm features.”


  • B.S.: National Engineering University, Lima, Peru
    • Major: Physics
  • PhD: Stony Brook University (Physics)
    • Graduate Program in Physics and Astronomy
    • Dissertation Title: Investigations of Electronic Noise in Selected Mesoscopic Devices

Professional Appointments

  • Postdoctoral Research: Stony Brook University (Physics)
    • Department of Physics and Astronomy
    • Project: Fabrication and study of quantum interferometers in the integer and fractional quantum Hall regimes

Selected Publications & Research Highlights

  • F. E. Camino, Facilities for Novel Device Fabrication in the Center for Functional Nanomaterials, 2D and Quantum Materials: Emerging Phenomena, Device Fabrication and Applications, (2020).
  • N. Mizuno, F. Camino, and X. Du, In-Situ Study of the Impact of Aberration-Corrected Electron-Beam Lithography on the Electronic Transport of Suspended Graphene Devices, Nanomaterials 10, 666 (2020).
  • Y. Li, J. Wu, F. Camino, G. D. Gu, I. Bo┼żovic, and  J. M. Tranquada, Large surface conductance and superconductivity in topological insulator microstructures, Applied Physics Letters 115, 173507 (2019).
  • F. E. Camino, V.R. Manfrinato, A. Stein, L. Zhang, M. Lu, E. A. Stach, and C. T.  Black, Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope, J. Vis. Exp. (139), e58272, (2018). [DOI:10.3791/58272]