My work involves using electron beam lithography to enable to fabrication of challenging nanostructures for a variety of applications. These include fabrication of x-ray optics, articifial spin ice arrays of nanomagnets, and templates for nanomaterial growth and study. I am interested in pushing the limits of electron beam lithography, through advanced metrology techniques using synchrotron x-ray diffraction and advanced processing techniques.
Z. Budrikis, J.P. Morgan, J. Akerman, A. Stein, P.Politi, S. Langridge, C.H. Marrows, R.L. Stamps, “Disorder strength and field-driven ground state domain formation in artificial spin-ce: experiment, simulation and theory,” Physical Review Letters, 109, 037203 (2012).
J.P Morgan, A. Stein, S. Langridge, C. H. Marrows, “Thermal Ground State Ordering and Elementary Excitations in Artificial Magnetic Square Ice,” Nature Physics, 7, 75-79 (2011).
S. Kocaman, M. S. Aras, P. Hsieh, J. F. McMillan, C. G. Biris, N. C. Panoiu, M. B. Yu, D. L. Kwong, A. Stein, C. W. Wong, “Zero phase delay in negative-refractive-index photonic crystal superlattices,” Nature Photonics, 5, 499-505 (2011).
A. Stein, K. Evans-Lutterodt, N. Bozovic, A. Taylor, “Fabrication of silicon kinoform lenses for hard X-ray focusing by electron beam lithography and deep reactive ion etching,” Journal of Vacuum Science and Technology B, 26 (1), 122-127 (2008).
K. Evans-Lutterodt, A. Stein, N. Bozovic, A. Taylor, D.M. Tennant, “Using compound kinoform hard x-ray lenses to exceed the critical angle limit,” Physical Review Letters, 99, 134801 (2007).