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Aaron Stein

Staff Scientist | Electronic Nanomaterials

Expertise

  • Electron beam lithography
  • Nanofabrication & nanostructures
  • Scanning electron microscopy

CFN Research Activities

Electron-beam lithography and associated nanofabrication techniques are the driver behind a large swath of study at the nanoscale. My work involves using these techniques - and developing new ones - to enable the study of new materials and structures for a variety of applications. These include directed self-assembly of block co-polymers, fabrication of x-ray optics, artificial spin ice arrays of nanomagnets and photonic and metamaterial structures. I am also interested in applying nanofabrication processes to new materials and systems for quantum information applications. Additionally, my research involves pushing the limits of lithographic techniques themselves: the tools, the lithographic materials, experimental design and fabrication processes.

Education

  • B.A.: Tufts University
  • Major: Physics, Philosophy
  • PhD: State University of New York – Stony Brook
    • Physics
    • Dissertation Title: Focusing Optics for Soft and Hard X-rays Fabrication, Replication and Simulations

Selected Publications & Research Highlights

ORCID: https://orcid.org/0000-0003-4424-5416

  • J. Jiang, L. Shterengas, T. Hosoda, A. Stein, A. Belyanin, G. Kipshidze, G. Belenky, Dual Wavelength Operation of the GaSb-based Y-branch Distributed Bragg Reflector Lasers Near 2.1 μm, Semiconductor Science and Technology 35 (2) id.025016 (2020). [DOI: 10.1088/1361-6641/ab63bc]
  • N. Tiwale, A. Subramanian, K. Kisslinger, M. Lu, J. Kim, A. Stein, C.Y. Nam, Advancing Next Generation Nanolithography with Infiltration Synthesis of Hybrid Nanocomposite Resists, Journal of Materials Chemistry C 7 (29), 8803-8812 (2019). [DOI: 10.1039/C9TC02974E]
  • V.R. Manfrinato, A. Stein, L. Zhang, C.-Y. Nam, K.G. Yager, E.A. Stach, C.T. Black, Aberration-corrected Electron Beam Lithography at the One Nanometer Length Scale, Nano Letters 17 (8), 4562-4567 (2017). [DOI: 10.1021/acs.nanolett.7b00514]
  • Z.Li, M.H. Kim, C. Wang, Z. Han, S. Shrestha, A.C. Overvig, M.Lu, A. Stein, A.M. Agarwal, M. Loncar & N. Yu, Controlling Propagation and Coupling of Waveguide Modes Using Phase-Gradient Metasurface, Nature Nanotechnology 12 (7), 675 (2017). [DOI: 10.1038/nnano.2017.50]
  • M. Zhang, D. J. Magagnosc, I. Liberal, Y. Yu, H. Yun, H. Yang, Y. Wu, J. Guo, W. Chen, Y. J. Shin, A. Stein, J. M. Kikkawa, N. Engheta, D. S. Gianola, C. B. Murray & C. R. Kagan, High-Strength Magnetically Switchable Plasmonic Nanorods Assembled From a Binary Nanocrystal Mixture, Nature Nanotechnology 12, 228-232 (2017). [DOI: 10.1038/nnano.2016.235]
  • Stein, G. Wright, K.G. Yager, G.S. Doerk, C.T. Black, Selective Directed Self-Assembly of Coexisting Morphologies Using Block Copolymer Blends, Nature Communications 7 (1), 1-7 (2016). [DOI: 10.1038/ncomms12366]
  • L Li, I Bayn, M Lu, CY Nam, T Schröder, A Stein, NC Harris, D Englund, Nanofabrication on Unconventional Substrates Using Transferred Hard Masks, Scientific Reports 5 (1), 1-6 (2015). [DOI: 10.1038/srep07802]
  • J.P. Morgan, A. Stein, S. Langridge, C.H. Marrows, Thermal Ground-State Ordering and Elementary Excitations in Artificial Magnetic Square Ice, Nature Physics 7 (1), 75-79v (2011). [DOI: 10.1038/nphys1853]
  • K. Evans-Lutterodt, A. Stein, J.M. Ablett, N. Bozovic, A. Taylor, D.M. Tennant, Using Compound Kinoform Hard-X-Ray Lenses to Exceed The Critical Angle Limit, Physical Review Letters 99 (13), 134801 (2007). [DOI: 10.1103/PhysRevLett.99.134801]
  • L.E Ocola, A. Stein, Effect of Cold Development on Improvement In Electron-Beam Nanopatterning Resolution And Line Roughness, Journal of Vacuum Science & Technology B 24 (6), 3061-3065 (2006). [DOI: 10.1116/1.2366698]