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Vitor Manfrinato

Research Associate | Electron Microscopy

Expertise

  • Electron Beam Lithography
  • Ion Beam Lithography
  • Transmission Electron Microscopy
  • Electron Energy Loss Spectroscopy
  • Plasmonics

CFN Research Activities

We are developing sub-5 nm electron-beam lithography (EBL) by using an aberration-corrected scanning transmission electron microscope as the exposure system. We have demonstrated that this EBL system is able to print 2 nm isolated features and 10 nm pitch (periodic) structures in hydrogen silsesquioxane resist. We will apply this EBL technique to investigate and control the functionality of nanomaterials at the sub-5 nm length scale.

Education

  • B.S.: University of Sao Paulo
    • Major: Electrical Engineering
    • Undergraduate Thesis Tittle: Fabrication of Graphene Nanoribbons (advisor: Prof. Jing Kong at MIT)
  • MS: Massachusetts Institute of Technology
    • Electrical Engineering
    • Dissertation Title: Sub-10 nm Electron Beam Lithography for Templated Placement of Colloidal Quantum Dots (advisor: Prof. Karl K. Berggren)
  • PhD: Massachusetts Institute of Technology
    • Electrical Engineering
    • Dissertation Title: Electron Beam Lithography Towards the Atomic Scale and Applications to Nano-Optics (advisor: Prof. Karl K. Berggren)

Selected Publications & Research Highlights

 

  • Hobbs, R.G.*; Manfrinato, V.R.*; Yang, Y.*; Goodman, S.A.*; Zhang, L.; Stach, E.A.; Berggren, K.K. High-energy surface and volume plasmons in nanopatterned sub-10 nm aluminum nanostructures, Nano Letters 2016 DOI:10.1021/acs.nanolett.6b01012)*equal contribution
  • Manfrinato, V.; Wen, J.; Zhang, L.; Yang, Y.; Hobbs, R.; Baker, B.; Su, D.; Zakharov, D.; Zaluzec, N.; Miller, D.; Stach, E.; Berggren, K., Determining the resolution limits of electron-beam lithography: direct measurement of the point-spread function, Nano Letters 2014, 14, 4406–4412.

  • Manfrinato, V.; Zhang, L.; Su, D.; Duan, H.; Hobbs, R.; Stach, E.; Berggren, K., Resolution Limits of Electron-Beam Lithography toward the Atomic Scale. Nano Letters 2013, 13, 1555-1558.
  • Manfrinato, V.; Wanger, D.; Strasfeld, D.; Han, H.; Marsili, F.; Arrieta, J.; Mentzel, T.; Bawendi, M.; Berggren, K., Controlled placement of colloidal quantum dots in sub-15 nm clusters. Nanotechnology 2013, 24, 125302
  • Winston, D.*; Manfrinato, V*.; Nicaise, S.*; Cheong, L.*; Duan, H.; Ferranti, D.; Marshman, J.; McVey, S.; Stern, L.; Notte, J.; Berggren, K., Neon Ion Beam Lithography (NIBL). Nano Letters 2011, 11, 4343-4347
  • Campos, L.*; Manfrinato, V*.; Sanchez-Yamagishi, J.; Kong, J.; Jarillo-Herrero, P., Anisotropic Etching and Nanoribbon Formation in Single-Layer Graphene. Nano Letters 2009, 9, 2600-2604