My research focuses on the exploration of new methods and new materials for nanofabrication, especially for photonics and x-ray microscopy applications. Reliable processes have be established for fabricating high-aspect-ratio nano-structures, high-quality silicon photonic devices and novel metallic nanoslit waveguides. An e-beam lithography exposure algorithm was developed and commercialized to improve the fidelity of high-resolution curved patterns. Recent research interests include the performance improvement for lithography materials and new plasma etch process development.
D. E. Johnston, M. Lu, C. T. Black, Plasma etch transfer of self-assembled polymer patterns, J. Micro/Nanolith. MEMS MOEMS, 11, 031306 (2012).
J. Tan, M. Lu, A. Stein, and W. Jiang, High-purity transmission of a slow light odd mode in a photonic crystal waveguide, Opt. Lett., 37, 3189 (2012),
H. Yan, V. Rose, D. Shu, E. Lima, H. C. Kang, R. Conley, C. Liu, N. Jahedi, A. T. Macrander, G. B. Stephenson, M. Holt, Y. S. Chu, M. Lu, and J. Maser, Two dimensional hard x-ray nanofocusing with crossed multilayer Laue lenses, Opt. Express 19, 15069-15076 (2011).
M. Lu, L. Ocola, S. Gray, and G. Wiederrecht, Fabrication of metallic nanoslits waveguides with sharp bends”, J. Vac. Sci. Technol. B 26, 2151 (2008).
M. Lu, L. E. Ocola, R. Divan, and D. C. Mancini, Fabrication of high-aspect-ratio hard x-ray zone Plates with HSQ plating molds, Proc. of SPIE, Vol. 7039, 70390V, Nanoengineering: Fabrication, Properties, Optics, and Devices V (2008).
M. Lu, D. Tennant, and C. Jacobsen, Orientation dependence of the linewidth in sub-50-nm gaussian e-beam Nanolithography, J. Vac. Sci. Technol. B 24, 2881 (2006).